Chemical Engineering Journal [IF 15.1 - JCR Rank 3.57% in ENGINEERING, CHEMICAL]
R.
Kumar, S. Chakrabortty, P. Chakrabortty, J. Nayak, C. Liu, M. Ali, G.-S. Ha, H.
Kwang, S. Moon, H.-S. Roh, S. K. Tripathy, B.-H. Jeon
https://doi.org/10.1016/j.cej.2023.144169